The doping concentration of starting wafer is 1E+13cm^-3 The NPN BJT has to be designed with following example and design rules. An excel workbook is to be provided with all process steps specified. Modularize into subroutines as appropriate showing each section, parameters to follow, temperature setpoints, etc.. Dimensioned drawings of each mask are to be included along with all calculations appropriate to achieve the design rule specs. Any assumptions made must be explicitly stated. Design Rules Design Example